2-inch 2-yuan sputtering device 'HMS2-300'
The flat heater can heat up to a maximum of 600°C! A sputtering device compatible with film formation under vacuum and gas replacement atmospheres!
The "HMS2-300" is a 2-inch dual-target sputtering device capable of heating up to 600°C through flat heater heating, allowing for film formation at high temperatures. It supports film formation under vacuum and gas replacement atmospheres. It is equipped with a 2-inch magnetron sputter cathode and can be expanded to a maximum of three targets. Options include an L/L chamber, a movable film thickness gauge, and a bias mechanism. 【Features】 ■ Capable of heating up to 600°C through flat heater heating ■ Supports film formation under vacuum and gas replacement atmospheres ■ Equipped with a 2-inch magnetron sputter cathode (expandable to a maximum of three targets) ■ Options for L/L chamber, movable film thickness gauge, and bias mechanism ■ Compact installation space of W535×D1000×H1800mm *For more details, please refer to the PDF document or feel free to contact us.
- Company：ハイブリッジ 東京営業所
- Price：Other
